Sputtering Targets & Crucibles

Sputtering Targets
OXIDES Hafnium Oxide(HfO2 10-15% Y2C3 Stab.) Strontium Zirconate(SrZrO3
Aluminum Oxide(Al2O3) Indium Oxide(In2O3 Tantalum Oxide(Ta2O5
Antimony Oxide(Sb2O3 Lanthanum Oxide(La2O3 Thorium Oxide(ThO2
Barium Titanate(BaTiO3 Lead Titanate(PbTiO3 Tin Oxide(SnO2
Bismuth Oxide(Bi2O3 Lead Zircinate(PbZrO3 Titanium Oxide(TiO2
Bismuth Oxide(Bi2TiO5 Magnesium Oxide(MgO) Tungsten Oxide(WO3
Bismuth Oxide(Bi4Ti3O12 Magnesium Oxide(MoO3) Yttrium Oxide(Y2O3
Cerium Oxide(CeO2 Niobium Oxide(Nb2O5 Zinc Oxide(ZnO)
Chromium Oxide(Cr2O3 Silicon Dioxide(SiO2 Zirconium Oxide(ZrO2 Unstab.)
Hafnium Oxide(HfO2 Unstab.) Silicon Monoxide(SiO) Zirconium Oxide(ZrO2 5-10 CaO Stab)
Hafnium Oxide(HfO2 10-15% CaO Stab.) Strontium Titanate(SrTiO3 Zirconium Oxide(ZrO2 5-10 Y2O3
BORIDES Molybdenum Boride(Mo2B6 Tungsten Boride(WB)
Chromium Boride(CrB2) Niobium Boride(NbB2 Tungsten Boride(W2B)
Hafnium Boride(HfB2 Tantalum Boride(TaB2 Vanadium Boride(VB2
Lanthanum Boride(LaB6 Titanium Boride(TaB2 Zirconium Boride(ZrB2
CARBIDES Niobium Carbide(NbC) Tungsten Carbide-Cobalt(WV-6% Co)
Boron Carbide(B4C) Silicon Carbide(SiC) Tungsten Carbide-Cobalt(WC 12% Co)
Chromium Carbide(Cr3C2 Tantalum Carbide(TaC) Vanadium Carbide(VC)
Hafnium Carbide(HfC) Titanium Carbide(TiC) Zirconium Carbide(ZrC)
Molybdenum Carbide(Mo2C) Tungsten Carbide(WC)
FLUORIDES Lanthanum Fluoride(LaF3 Sodium Aluminum Fluoride(Na3AIF6
Aluminum Fluoride(AlF3) Lead Fluoride(PbF2 Thorium Fluoride(ThF4
Barium Fluoride(BaF2 Lithium Fluoride(LiF) Yttrium Fluoride(YF3
Calcium Fluoride(CeF3 Magnesium Fluoride(MgF2)
Cerium Fluoride(CeF3 Sodium Fluoride(NaF)
METALS From Aluminum to Zirconium
NITRIDES Niobium Nitride(NbN) Titanium Nitride(TiN)
Aluminum Nitride(AIN) Silicon Nitride Technical(Si3N4) Vanadium Nitride(VN)
Boron Nitride(BN) Silicon Nitride Electronic(Si3N4) Zirconium Nitride(ZrN)
Hafnium Nitride(HfN) Tantalum Nitrode(TaN)
SILICIDES Niobium Silicide(NbSi2) Tungsten Silicide(WSi2)
Chromium Silicide(CrSi2) Tantalum Silicide(TaSi2) Vanadium Silicide(VSi2)
Chromium Silicide(Cr3Si) Tantalum Silicide(Ta5Si2) Vanadium Silicide(V3Si)
Hafnium Silicide(HfSi2) Titanium Silicide(TiSi2) Zirconium Silicide(ZrSi2)
Molybdenum Silicide(MoSi2) Titanium Silicide(Ti5Si2)
SULFIDES,SELENIDES,TELLURIDES Tantalum Sulfide(TaS2)
Arsenic Sulfide(As2S3) Molybdenum Selenide(MoSe2) Tantalum Telluride(TaTe2)
Cadmium Selenide(CdSe) Molybdenum Sulfide(MoS2) Tungsten Selenide(WSe2)
Cadmium Sulfide(CdS) Molybdenum Telluride(MoTe2) Tungsten Sulfide(WS2)
Cadmium Telliride(CdTe) Niobium Selenide(NbSe2) Tungsten Telluride(WTe2)
Lead Selenide(PbSe) Niobium Sulfide(NbS175) Zinc Selenide(ZnSe)
Lead Sulfide(PbS) Niobium Telluride(NbTe2) Zinc Sulfide(ZnS)
Lead Tellureide(PbTe) Tantalum Selenide(TaSe2) Zinc Telluride(ZnTe)
OTHER Nichrome(70Ni-30Cr,60Ni-40Cr) Tungsten 15% Titanium
Superconductor 50Ni-50Cr Si/Fe/AL
Chromium/Silicon Monoxide(any ratio) Permalloy(Ni-19Fe) ITO(High Density)
Nichrome(80Ni-20Cr) Tungsten 10% Titanium

Crucible
Graphite Aluminum Oxide Tantalum
Carbon Boron Nitride Quartz
Molybdenum Intermetallic Zirconium
Tungsten Vitreous Carbon Precious Metals

Purity
Sputtering Targets are available in various purities from 99.9% to 99.9999%.

Geometrics
Targets are available for all sputtering systems, Round up to 21" and rectangular up to 60" long.
Other configurations include S-Gun, Delta, Ring and custom shapes.


Backing Plates and Bondings
Also provides full bonding service.
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