| Material parameter | |
| Formula: | TiO2 |
| Crystal growth | |
| @Growth method: | Flame fused-method (Verneuil) |
| @Growth direction: | (001) |
| @Max.diameter: | 1.5inch |
| Crystallographic properties | |
| @Structure: @@tetragonal: |
a,b=0.4593nm c=0.2959nm |
| @Domain structure: @@for optical application: @@for ectronical application: |
domain free with domains |
| @Colour: | slight yellow |
| Physical properties | |
| @Density: | 4.25gcm-3 |
| @Melting point: | 1825 |
| @Thermal expansion: | par.c:@@9.9~10-6K-1 perp.c:@@7.2~10-6K-1 |
| @Dielectric constant: | par.c:@@@190 perp.c:@@@85 |
| @Loss tangent: | 17~10-3 |
| Substrate parameter | |
| Orientation: | (100); (001) other orientations on request |
| Tolerance of orientation: | maximum1;typical<40' |
| Dimension: | standard: 10~10o2; 10~5o2; 12.7~12.7o2 1inch dia. other dimension on request |
| Tolerance of dimension: | +0/-0.05o |
| Thickness: | standard :@@0.5o, 1o
other thickness0.1o on request |
| Tolerance of thickness: | +0/-0.02o |
| Polish: | one- or both side epipolished |
| Surface quality: | scratch- and wiperfree by magnification of 800 measured with Kugler KMS Interferometermicroscope each charge with certification |
| Parallelity: | typ.<10' |
| Flatness: | typ.<1Κm/10o (test region 98%) |
| Roughness: (Ιcutoff =0.08mm) |
Ra:typ.<0.8nm Rq:typ.<1.0nm Rt:typ.<4.0nm |